Members of the International Program Committee of the EMLC 2015
Conference Chairs
Uwe Behringer, UBC Microelectronics, Ammerbuch, Germany
Jo Finders, ASML, Veldhoven, Netherlands
Co-Conference Chairs
Chris Gale, Applied Materials, Dresden, Germany
Naoya Hayashi, DNP, Saitama, Japan
Program Chairs
Daniel Sarlette, Infineon Technologies GmbH, Dresden, Germany
Brid Connolly, Toppan Photomasks GmbH, Dresden, Germany
Rolf Seltmann, Globalfoundries, Dresden, Germany
Other Members
Paul Ackmann, Globalfoundries Inc., Santa Clara, USA
Michael Arnz, Carl Zeiss SMT AG, Oberkochen, Germany
Carola Blaesing, Carl Zeiss SMS GmbH, Jena, Germany
Parkson Chen, Taiwan Mask Corp., Hsinchu,Taiwan
Natalia Davydova, ASML, Veldhoven, The Netherlands
Dave Farrar, HOYA Corporation, London, UK
Rik Jonckheere, IMEC, Leuven, Belgium
Barbara Lauche, Photronics MZD GmbH, Dresden, Germany
Bertrand Le Gratiet, STMicroelectronics, Crolles, Cedex, France
Carlos Lee, EPIC - European Photonics Industery Consortium, Brussels, Belgium
Hans Löschner, IMS Nanofabrication AG, Vienna, Austria
Wilhelm Maurer, Infineon, Munich, Germany
Hiroaki Morimoto, Toppan Printing Co., Ltd., Tokyo, Japan
Jan Hendrik Peters, Carl Zeiss SMS GmbH, Jena, Germany
Emmanuel Rausa, Plasma-Therm USA, St Petersburg, FL, USA
Douglas Resnick, Molecular Imprints Inc., Austin, Texas, USA
Klaus-Dieter Röth, KLA-Tencor MIE, Weilburg, Germany
Thomas Scherübl, Carl Zeiss SMS GmbH, Jena, Germany
Ronald Schnabel, VDE/VDI-GMM, Frankfurt, Germany
Steffen Schulze, Mentor Graphics Corp. Wilsonville, OR, USA
Ines Stolberg, Vistec Electron Beam GmbH, Jena, Germany
Jacques Waelpoel, ASML, Veldhoven The Netherlands
John Whittey, KLA-Tencor, San José, USA
Jim Wiley, ASML US, Inc., Santa Clara, CA, USA
Carlton Willson, University of Texas, Austin, USA
Hermann Wolf, Photronics MZD GmbH, Dresden, Germany
Stefan Wurm, SEMATECH, Albany , NY, USA
Larry Zurbrick, Agilent Technologies, Santa Clara, CA, USA