The EMLC 2017 International Program Committee
Conference Chairs
Behringer, Uwe, UBC Microelectronics, Ammerbuch, Germany
Finders, Jo, ASML, Veldhoven, The Netherlands
Co-Conference Chairs
Connolly, Brid, Toppan Photomasks Inc., Dresden, Germany
Gale, Chris, Applied Materials, Dresden, Germany
Hayashi, Naoya, DNP, Saitama, Japan
Program Chairs
Stolberg, Ines, Vistec Electron Beam, Jena, Germany
Erdmann, Andreas, Fraunhofer IISB, Erlangen, Germany
Pozo, José, European Photonics Industry Consortium, Brussels, Belgium
Co-Program-Chairs
Seltmann, Rolf, Globalfoundries, Dresden, Germany
Sarlette, Daniel, Infineon, Dresden, Germany
Other Members
Blaesing, Carola, Carl Zeiss SMT, Jena, Germany
Chen, Parkson, Taiwan Mask Corp., Hsinchu,Taiwan
Ehrmann, Albrecht, Carl Zeiss SMT Oberkochen, Germany
Farrar, Dave, HOYA Corporation, London, UK
Jonckheere, Rik, IMEC, Leuven, Belgium
Lauche, Barbara, Photronics MZD GmbH, Dresden, Germany
Le Gratiet, Bertrand, ST Microelectronics, Crolles, France
Lee, Carlos, European Photonics Industry Consortium, Brussels, Belgium
Levinson, Harry, Globalfoundries, Santa Clara, CA, USA
Loeschner, Hans, IMS Nanofabrication AG, Vienna, Austria
Muehlberger, Michael, Profactor GmbH, Steyr-Gleink, Austria
Peters, Jan Hendrik, Carl Zeiss SMT, Jena, Germany
Progler, Chris, Photronics Inc., TX, USA
Resnick, Douglas J., CNT-Canon, USA
Roeth, Klaus-Dieter, KLA-Tencor MIE, Weilburg, Germany
Scheruebl, Thomas, Carl Zeiss SMS GmbH, Jena, Germany
Schnabel, Ronald, VDE/VDI-GMM, Frankfurt, Germany
Schulze, Steffen, Mentor Graphics Corp. Wilsonville, OR, USA
Tschinkl, Martin, AMTC, Dresden, Germany
Waelpoel, Jacques, ASML, Veldhoven The Netherlands
Wiley, Jim, ASML US Inc., Santa Clara, CA, USA
Willson, Grant, University of Texas, Austin, TX, USA
Wolf, Hermann, Photronics MZD GmbH, Dresden, Germany
Wurm, Stefan, ATICE LLC, Albany, NY, USA
Zurbrick, Larry, Keysight Technologies, Santa Clara, CA, USA