Members of the International Steering Committee,
the International Program Committee(*)
and the Local Committee of the EMLC 2010
Conference Chair: Dr. U. Behringer (*), UBC Microelectronics, Ammerbuch, Germany
Co-Conference Chairs: Mr. B. Grenon (*), Grenon Consulting, Colchester, VT, USA
Mr. N. Hayashi (*), DNP, Saitama, Japan
Program Chairs: Dr. W. Maurer (*), Infineon Technologies AG, Munich, Germany
J. Waelpoel (*), ASML, Veldhoven, The Netherlands
Co-Program Chair: Mr. W. Montgomery (*), SEMATECH, Albany, NY, USA
Dr. M. Arnz, Carl Zeiss SMT AG, Oberkochen, Germany (*)
Dr. C. Blaesing, Carl Zeiss SMS GmbH, Jena, Germany
Mr. P. Chen, Taiwan Mask Corp., Hsinchu,Taiwan (*)
Dr. C. Constantine, Oerlikon USA Inc., St. Petersburg, FL, USA(*)
Prof. R. Engelstad, University of Wisconsin, Madison, WI, USA (*)
Mr. B.G. Eynon, Molecular Imprints, Austin, TX, USA (*)
Mr. C. Gale, Applied Materials, Dresden, Germany (*)
Mr. B. Grenon, Grenon Consulting, Inc., Colchester,VT, USA (*)
Mr. N. Hayashi, Dai Nippon Printing Co. Ltd., Saitama, Japan (*)
Mr. R. Jonckheere, IMEC, Leuven, Belgium (*)
Ms. B. Lauche, Photronics MZD GmbH, Dresden, Germany
Dr. H. Loeschner, IMS Nanofabrication AG, Vienna, Austria (*)
Dr. W. Montgomery, SEMATECH, Albany, NY, USA
Mrs. V. Pequignat, AEPI, Grenoble, France
Dr. Ch. Pierrat, Cadence Design Systems Inc., San Jose, USA (*)
Mr. E. Rausa, Oerlikon USA Inc., Saint Petersburg, FL, USA (*)
Dr. C. Reita, CEA/Léti, Grenoble, France
Mr. D. J. Resnick, Molecular Imprints, Austin, TX, USA (*)
Dr. F. Reuther, micro resist technology GmbH, Berlin, Germany
Dr. C. Romeo, Numonyx, Agrate Brianza, Italy (*)
Mr. K. Ronse, IMEC, Leuven, Belgium
Prof. H. Scheer, University of Wuppertal, Germany (*)
Dr. R. Schnabel, VDE/VDI-GMM, Frankfurt, Germany (*)
Mr. M. Staples, GLOBALFOUNDRIES, Dresden, Germany
Mrs. I. Stolberg, Vistec Electron Beam GmbH, Jena, Germany (*)
Dr. S. Tedesco, CEA/Léti, Grenoble, France (*)
Dr. M. Tissier, Toppan Photomasks S.A., Rousset, France (*)
Mr. J.T. Weed, SYNOPSYS Inc., Mountain View, CA, USA
Mr. J. Whittey, KLA-Tencor, Oakdale, CA, USA (*)
Mr. H. Wolf, Photronics MZD GmbH, Dresden, Germany (*)
Mr. S. Wurm, SEMATECH, Albany , NY, USA (*)
Mr. L. Zurbrick, Agilent Technologies, Santa Clara, CA, USA (*)