Abstract Information
Abstract quality will be the basis for selection of conference presentations. The abstracts will be assessed for:
Therefore, we highly recommend that your abstract contains enough detail to clearly describe the content of your presentation. The abstracts should include at least one full page of text (minimum of 1000 words), the use of figures is encouraged.
Commercial papers, papers with no new research / development content, and papers where significant information is missing will not be accepted. All accepted abstracts will be printed, bound and handed out to the participants of the conference.
Please send your abstract as a MS-Word file to the Conference Chair, Dr. Uwe Behringer uwe.behringer.ubc@t-online.de, and to the Program Chairs, Dr. Wilhelm Maurer, wilhelm.maurer@infineon.com and Jacques Waelpoel, Jacques.waelpoel@asml.com
Deadline for Abstracts: September 28, 2009
By submitting an abstract you agree to
Authors will be notified of the acceptance of their submissions by October 1, 2009; further manuscript format and layout instructions will be provided at that time.
Manuscripts
Please, send the original of the manuscript a.s.a.p., latest by January 5, 2010
All manuscripts will be subject to a critical peer review before they are accepted as VDE publication. The VDE/GMM is in contact with SPIE for an additional publication in the SPIE Digital Library.
Please note: Late submissions may not be published.
Conference Topics
Presentations are solicited for the following and related topics:
Mask Manufacturing:
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Mask Data Preparation
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Pattern Generation: Writing, Etch, etc.
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Photomask Processes & Materials
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Metrology Tools & Technologies
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Defect Inspection & Repair
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Cleaning & Haze
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Pellicles & Mask Boxes
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Mask Process Yield & Cycle Time
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Photomasks for RET & OPC; PSM
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Masks for NGL: E-Beam, EUV, NIL, etc.
Mask Business:
Lithography and Mask Application:
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Double Patterning
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RET, OPC, PSM, MEEF
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Resist
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Mask Defect Printability
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Optical Materials
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Immersion Lithography
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Immersion Defectivity
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Alternate Immersion Fluids
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Lithography Process Control
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Lithography Simulation
Emerging Mask and Lithography Technologies:
Mask and Lithography Equipment