Members of the International Program Committee of the EMLC 2012

Conference Chair 

Uwe Behringer, UBC Microelectronics, Ammerbuch, Germany

Co-Conference Chair 

Naoya Hayashi, DNP, Saitama, Japan
Chris Gale, Applied Materials, Dresden, Germany

Program Chairs

Rolf Seltmann, Globalfoundries, Dresden, Germany
Jo Finders, ASML, Veldhoven, The Netherlands

Other Members

Michael Arnz, Carl Zeiss SMT AG, Oberkochen, Germany (*) 
Emanuele Baracchi, ST Microelectronics, Agrate Brianza
Joachim Bauer, IHP Microelectronics, Frankfurt Oder, Germany (*) 
Carola Blaesing, Carl Zeiss SMS GmbH, Jena, Germany
Parkson Chen, Taiwan Mask Corp., Hsinchu,Taiwan (*)
Brid Connolly, Toppan Photomasks Inc., Dresden, Germany (*) 
Roxann Engelstad, University of Wisconsin, Madison, WI, US (*) 
Jo Finders, ASML, Veldhoven, The Netherlands (*)
Chris Gale, Applied Materials, Dresden, Germany (*)
Brian J. Grenon, Grenon Consulting, Inc., Colchester, VT, USA
Naoya Hayashi, Dai Nippon Printing Co. Ltd., Saitama, Japan (*)
Rik Jonckheere, IMEC, Leuven, Belgium (*)
Barbara Lauche, Photronics MZD GmbH, Dresden, Germany
Hans Loeschner, IMS Nanofabrication AG, Vienna, Austria (*)
Wilhelm Maurer, Infineon Technologies AG, Munich, Germany (*) 
Chris Progler, Photronics Inc., USA
Emmanuel Rausa, Plasma-Therm USA, St Petersburg, FL, USA (*)
Douglas J. Resnick, Molecular Imprints, Austin, TX, USA  (*)
Klaus-Dieter Röth, KLA-Tencor MIE, Weilburg, Germany (*)
Carmelo Romeo, Numonyx, Agrate Brianza, Italy (*)
Hella Scheer, University of Wuppertal, Germany (*)
Thomas Scherübl, Carl Zeiss SMS GmbH, Jena, Germany (*) 
Ronald Schnabel, VDE/VDI-GMM, Frankfurt, Germany (*)
Steffen Schulze, Mentor Graphics Corp. Wilsonville, OR, USA (*) 
Rolf Seltmann, Globalfoundries, Dresden, Germany (*)
Mark Staples, Globalfoundries, Dresden, Germany
Ines Stolberg, Vistec Electron Beam GmbH, Jena, Germany (*) 
Serge Tedesco, CEA-LETI, Grenoble, France (*) 
Michel Tissier, Toppan Photomasks S.A., Rousset, France (*) 
Jacques Waelpoel, ASML, Veldhoven The Netherlands
Guido Wenz, Wenz Consulting, Weil im Schoenbuch, Germany (*) 
John Whittey, KLA-Tencor, San Jose, USA (*) 
Hermann Wolf, Photronics MZD GmbH, Dresden, Germany (*) 
Stefan Wurm, SEMATECH, Albany , NY, USA (*)
Larry Zurbrick, Agilent Technologies, Santa Clara, CA, USA (*)