10:50 |
Using UV-based Nanoimprint Lithography to Fabricate Single and Multilayer Negative Index Materials |
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I. Bergmair1, B. Dastmalchi2, M. Bergmair2, G. Hesser2, M. Losurdo3,G. Bruno3, C. Helgert4, E. Pshenay-Severin4, T. Pertsch4, E.-B. Kley4, U. Hübner5, R. Penciu6, N.-H. Shen6 , M. Kafesaki6, C.M. Soukoulis6, K. Hingerl2, M. Muehlberger1 1 Profactor GmbH, Steyr-Gleink, Austria 2 Johannes Kepler University Linz, Austria 3 University of Bari, Italy 4 Friedrich-Schiller-Universität Jena, Germany 5 Institute of Photonic Technology, Jena, Germany 6 Institute of Electronic Structure & Laser, Hellas, Greece |
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11:10 |
Enhanced E-beam Pattern Writing for Nano-Optics Based on Character Projection |
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E.-B. Kley1, H. Schmidt1, U. Zeitner2, M. Banasch3, B. Schnabel3 1 Friedrich-Schiller University Jena, Germany 2 Fraunhofer Institute of Applied Optics and Precision Engineering, Jena, Germany 3 Vistec Electron Beam GmbH, Jena, Germany |
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11:30 |
A Novel Tool for Frequency Assisted Thermal Nanoimprint |
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A. Mayer, S. Möllenbeck, K. Dhima, S. Wang, H.-C. Scheer, University of Wuppertal, Germany |
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11:50 |
Nanoimprint activities in Austria in the research project cluster NILaustria |
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M. Muehlberger1, H. Fachberger1, I. Bergmair1, M. Rohn1, B. Dittert1, T. Rothländer2, D. Nees2, M. Knapp3, T. Fromherz4 1 Profactor GmbH, Steyr, Austria 2 Johanneum Research Forschungsgesellschaft mbH, Weiz, Austria 3 Onkotec GmbH, Vestenötting, Waidhofen/Thaya, Austria 4 Johannes Kepler University, Linz, Austria
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12:10 |
Phase-Shift at Sub-Wavelength Holographic Lithography (SWHL) |
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V. Rakhovsky1, D. Knyazkov2, A. Shamaev2, V. Chernik2, A. Gavrikov2, D. Chelyubeev2, P. Mikheev, M. Borisov, Moscov, Russian Federation 1 Nanotech SWHL, Moscow, Russian Federation 2 IPMech RAS, Moscow, Russian Federation
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12:30 |
Lunch Break |
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