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EMLC 2013 - Committees 

Committees 

Members of the International Program Committee of the EMLC 2013


Conference Chair 

Uwe Behringer, UBC Microelectronics, Ammerbuch, Germany

Co-Conference Chair 

Naoya Hayashi, DNP, Saitama, Japan
Brid Connolly, Toppan Photomasks Inc., Dresden, Germany
Wilhelm Maurer, Infineon Technologies AG, Munich, Germany

Program Chair

Wilhelm Maurer, Infineon Technologies AG, Munich, Germany

Co-Program-Chairs 

Rolf Seltmann, Globalfoundries, Dresden, Germany
Jo Finders, ASML, Veldhoven, The Netherlands

Members

Michael Arnz, Carl Zeiss SMT AG, Oberkochen, Germany  
Emanuele Baracchi, ST Microelectronics, Agrate Brianza
Uwe Behringer, UBC Microelectronics, Ammerbuch, Germany
Carola Blaesing, Carl Zeiss SMS GmbH, Jena, Germany
Parkson Chen, Taiwan Mask Corp., Hsinchu,Taiwan
Brid Connolly, Toppan Photomasks Inc., Dresden, Germany  
Roxann Engelstad, University of Wisconsin, Madison, WI, US  
Jo Finders, ASML, Veldhoven, The Netherlands
Chris Gale, Applied Materials, Dresden, Germany
Brian J. Grenon, Grenon Consulting, Inc., Colchester, VT, USA
Naoya Hayashi, Dai Nippon Printing Co. Ltd., Saitama, Japan
Rik Jonckheere, IMEC, Leuven, Belgium
Barbara Lauche, Photronics MZD GmbH, Dresden, Germany
Hans Loeschner, IMS Nanofabrication AG, Vienna, Austria
Wilhelm Maurer, Infineon Technologies AG, Munich, Germany  
Chris Progler, Photronics Inc., USA
Emmanuel Rausa, Plasma-Therm USA, St Petersburg, FL, USA
Douglas J. Resnick, Molecular Imprints, Austin, TX, USA 
Klaus-Dieter Röth, KLA-Tencor MIE, Weilburg, Germany
Carmelo Romeo, Numonyx, Agrate Brianza, Italy
Hella Scheer, University of Wuppertal, Germany
Thomas Scherübl, Carl Zeiss SMS GmbH, Jena, Germany  
Ronald Schnabel, VDE/VDI-GMM, Frankfurt, Germany
Steffen Schulze, Mentor Graphics Corp. Wilsonville, OR, USA  
Rolf Seltmann, Globalfoundries, Dresden, Germany
Mark Staples, Globalfoundries, Dresden, Germany
Ines Stolberg, Vistec Electron Beam GmbH, Jena, Germany  
Serge Tedesco, CEA-LETI, Grenoble, France  
Michel Tissier, Toppan Photomasks S.A., Rousset, France  
Jacques Waelpoel, ASML, Veldhoven The Netherlands
Guido Wenz, Wenz Consulting, Weil im Schoenbuch, Germany  
John Whittey, KLA-Tencor, San Jose, USA  
Hermann Wolf, Photronics MZD GmbH, Dresden, Germany  
Stefan Wurm, SEMATECH, Albany , NY, USA
Larry Zurbrick, Agilent Technologies, Santa Clara, CA, USA  

 Cooperating Partners

Photomask Japan
Silicon Saxony
 
 
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