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EMLC 2013 - Key Notes 

Key Notes 



Dr. Gerd Teepe
Director Design Engineering


 Invited Welcome Speaker

Gerd Teepe is heading the Design Engineering Organization of GLOBALFOUNDRIES. The organization provides designs and support to customers including SOC-design proof-points, advanced test- and yield learning devices, design migration services and hands-on design consultations.

Dr. Teepe has been with GLOBALFOUNDRIES since its inception in 2009. Before
this time he was with AMD since 2004, serving as Design Director of the AMD Dresden
Design Center.

Dr. Teepe studied electrical engineering at the RWTH Aachen University, Germany,
concluding with a diploma in 1982 and a PhD in 1986. His first industry position was
with NEC in Tokyo, Japan, where he carried out research in fault-tolerant microarchitectures.
From 1987 until 2004 Dr. Teepe was with Motorola-Semiconductors in
a sequence of functions: IC-Design Engineering, IC-Design Management, as well as
Marketing- and Operations Management. In his last position he was heading the
“Strategy and Advanced Systems Labs” in Munich and Detroit, in charge to develop
the strategy for the automotive business unit with 1.5 B$ of sales at that time. In his
career with Motorola, Dr. Teepe has been working out of Geneva, Toulouse and
Munich with global reporting.

In the past 31 years of his career in the semiconductor industry he has published
more than 60 scientific papers, and he is member of the German engineering
organizations VDE and VDI.





Harry J. Levinson
Sr. Fellow and Director of Strategic Lithography Technology


"The Lithographer's Dilemma: Shrinking without Breaking the Bank"



Harry J. Levinson is a Sr. Fellow and Director of GLOBALFOUNDRIES’s Strategic Lithography Technology Department, which is responsible for advanced lithographic processes and equipment.

Dr. Levinson started his career in Bipolar Memory Development at AMD, then spent some time at Sierra Semiconductor and IBM, before returning to AMD – now GLOBALFOUNDRIES – in 1994. 

He has published numerous articles on lithographic science, on topics ranging from thin film optical effects and metrics for imaging, to overlay and process control, and he is the author of two books, Lithography Process Control and Principles of Lithography.  

He holds over 50 US patents. Dr. Levinson is an SPIE Fellow, previously chaired the SPIE Publications Committee, and is currently Chairman for the SPIE Advanced Lithography Symposium. He has a BS in engineering from Cornell University and a PhD in Physics from the University of Pennsylvania.



Hiroaki Morimoto
Toppan Printing Co., Ltd.


"Photomask Technology Progress to meet with Electrics Product Requirements"


Hiroaki Morimoto received B.S. degree and Ph. D degree in Electronic Engineering from Kyoto University in 1977 and 1987, respectively.

He had been engaged in photomask and photolithography technologies in Mitsubishi Electronic Corporation.

He joined Toppan Printing in 2003, and he had been responsible for photomask R&D.
In 2012, he has moved to R&D and marketing division in headquarter, and engaged in electronics products including photomask.

 Cooperating Partners

Photomask Japan
Silicon Saxony
Impressum | © 2010 VDE Verband der Elektrotechnik Elektronik Informationstechnik e.V.