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EMLC 2014 - Committees 

Committees 

Members of the International Program Committee of the EMLC 2014

Conference Chair 

Uwe Behringer, UBC Microelectronics, Ammerbuch, Germany

Co-Conference Chairs 

Naoya Hayashi, DNP, Saitama, Japan
Brid Connolly, Toppan Photomasks Inc., Dresden, Germany
Chris Gale, Applied Materials, Dresden, Germany

Program Chairs

Jo Finders, ASML, Veldhoven, The Netherlands
Daniel Sarlette, Infineon, Dresden, Germany
Rolf Seltmann, Globalfoundries, Dresden, Germany


Other Members

Michael Arnz, Carl Zeiss SMT AG, Oberkochen, Germany
Emanuele Baracchi, ST Microelectronics, Agrate Brianza, Italy  
Carola Blaesing, Carl Zeiss SMS GmbH, Jena, Germany
Parkson Chen, Taiwan Mask Corp., Hsinchu,Taiwan
Natalia Davydova, ASML, Veldhoven, The Netherlands 
Rik Jonckheere, IMEC, Leuven, Belgium
Kurt Kimmel, Globalfoundries, Malta, NY, USA 
Barbara Lauche, Photronics MZD GmbH, Dresden, Germany
Harry Levinson, Globalfoundries, USA 
Hans Löschner, IMS Nanofabrication AG, Vienna, Austria
Jan Hendrik Peters, Carl Zeiss SMS GmbH, Jena, Germany
Chris Progler, Photronics Inc., USA
Emmanuel Rausa, Plasma-Therm USA, St Petersburg, FL, USA
Douglas J. Resnick, Molecular Imprints, Austin, TX, USA 
Klaus-Dieter Röth, KLA-Tencor MIE, Weilburg, Germany 
Hella Scheer, University of Wuppertal, Germany
Thomas Scherübl, Carl Zeiss SMS GmbH, Jena, Germany  
Ronald Schnabel, VDE/VDI-GMM, Frankfurt, Germany
Steffen Schulze, Mentor Graphics Corp. Wilsonville, OR, USA  
Mark Staples, Globalfoundries, Dresden, Germany
Ines Stolberg, Vistec Electron Beam GmbH, Jena, Germany  
Serge Tedesco, CEA-LETI, Grenoble, France  
Jacques Waelpoel, ASML, Veldhoven The Netherlands
Guido Wenz, Wenz Consulting, Weil im Schoenbuch, Germany  
Hermann Wolf, Photronics MZD GmbH, Dresden, Germany  
Stefan Wurm, SEMATECH, Albany , NY, USA
Larry Zurbrick, Agilent Technologies, Santa Clara, CA, USA  

 Cooperating Partners

Photomask Japan
 
 
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