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EMLC 2017 - Key Notes and Invited Speakers 

Key Notes and Invited Speakers 

 

The EMLC2017 Program Committee has defined following

Main Conference Keynotes and Invited Speakers:

 

Tuesday, June 27th, 2017

  • The power of power-semiconductors (Invited)
    We
    lcome Speaker
    Mathias Kamolz, Infineon Technologies AG, Dresden, Germany
  • The status and challenges of the EUV photomask ecosystem (Keynote)
    James N. Wiley, ASML US Inc., Santa Clara, CA, USA
  • Best Paper of BACUS 2016 with updates (Invited)
    MBMW-101 multi-beam Mask Writing Performance

    Elmar Platzgummer, IMS Nanofabrication AG, Vienna, Austria
  • Breaking the Paradigm: FDX Technology at Globalfoundries (Keynote)
    Bryan Rice, Globalfoundries, Dresden, Germany
  •  Best Poster of BACUS 2016 (Invited)
    7 nm e-beam resist sensitivity characterization

    Yusuke Toda, Toppan Photomasks, Inc., Essex Junction, VT, USA,
    Amy Zweber, Globalfoundries, Essex Junction, VT, USA
  • Recent EUV developments at IMEC (Invited)
    Kurt Ronse, IMEC, Leuven, Belgium

Wednesday, June 28th, 2017

  • Integral nature of masks through five decades (Keynote)
    Paul Ackmann, Globalfoundries Inc., Santa Clara, USA;
    Tom Faure, Globalfoundries, Vermont, USA
  • Report on the panel Discussion of BACUS 2016 (Invited):
    The impact of full-scale curvilinear ILT OPC on photomask manufacturing

    Peter Buck, Mentor Graphics, USA
  • Report on the panel discussion of Photomask Japan 2017 (Invited):
    Race for volume production – who is closer to goal: EUVL of NIL?

    Uwe Behringer, UBC Microelectronics, Germany
  • Technical trends of large-size photomasks for flat panel displays (Invited)
    Koichiro Yoshida, HOYA Corporation, Tokyo, Japan
  • Computational nanometrology of line edge roughness: Recent challenges and advances (Invited)
    V. Constantoudis, Nanometrisis, Greece

 

 Cooperating Partners

Photomask Japan
 
 
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