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EMLC 2017 


EMLC 2017 Conference attendees have the possibility of taking part in a 

Tutorial at the Hilton Hotel on
Monday, June 26th  2017, 13:30 to 16:30 

Interested persons have to register separately for the EMLC Conference and for the Tutorial.


EMLC 2017 - Tutorial

Andreas Erdmann, Fraunhofer IISB, Erlangen, Germany
Jo Finders, ASML, Veldhoven, The Netherlands 

General Introduction into Lithographic Imaging by Projection Optics
Andreas Erdmann, Fraunhofer IISB, Erlangen, Germany (90 minutes)

“The course will start with an introduction to image formation in lithographic projection systems. Important concepts of the imaging including diffraction limitation, coherence, off-axis illumination, polarization, wave aberrations of the projection lens and mask topography effects will be discussed and demonstrated by selected simulation examples.”

Interaction of Mask and Scanner in EUV Projection Optics
Jo Finders, ASML, Veldhoven, The Netherlands (90 minutes)

In the second part we will explain in detail  the interaction between Mask 3D effects and Projection optics in EUV lithography: We will show how the diffraction behavior in terms of intensity and phase is changed due to mask topography  and during propagation through the projection optics. We will highlight the impact on best focus per feature, source optimization and image placement through focus.


 Cooperating Partners

Photomask Japan
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