The EMLC 2018 International Program Committee
Conference Chairs
Behringer, Uwe, UBC Microelectronics, Ammerbuch, Germany
Finders, Jo, ASML, Veldhoven, The Netherlands
Co-Conference Chairs
Connolly, Brid, Toppan Photomasks Inc., Dresden, Germany
Gale, Chris, Applied Materials, Dresden, Germany
Hayashi, Naoya, DNP, Saitama, Japan
Program Chairs
Stolberg, Ines, Vistec Electron Beam, Jena, Germany
Erdmann, Andreas, Fraunhofer IISB, Erlangen, Germany
Co-Program-Chairs
Seltmann, Rolf, Globalfoundries, Dresden, Germany
Sarlette, Daniel, Infineon, Dresden, Germany
Other Members
Ehrmann, Albrecht, Carl Zeiss SMT Oberkochen, Germany
Farrar, Dave, HOYA Corporation, London, UK
Galler, Reinhard, EQUicon, Jena, Germany
Jonckheere, Rik, IMEC, Leuven, Belgium
Kapilevich, Izak, Applied Materialsc Inc., Santa Clara, CA, USA
Lauche, Barbara, Photronics MZD GmbH, Dresden, Germany
Le Gratiet, Bertrand, ST Microelectronics, Crolles, France
Levinson, Harry, Globalfoundries, Santa Clara, CA, USA
Loeschner, Hans, IMS Nanofabrication GmbH, Vienna, Austria
Muehlberger, Michael, Profactor GmbH, Steyr-Gleink, Austria
Pain, Laurent, CEA-LETI, Grenoble, France
Peters, Jan Hendrik, bmbg consult, Radebeul, Germany
Progler, Chris, Photronics Inc., San Jose, CA, USA
Roeth, Klaus-Dieter, KLA-Tencor MIE, Weilburg, Germany
Savari, Serap, Texas A&M University College Station, USA
Scheruebl, Thomas, Carl Zeiss SMT GmbH, Jena, Germany
Schnabel, Ronald, VDE/VDI-GMM, Frankfurt, Germany
Schulze, Steffen, Mentor Graphics Corp. Wilsonville, OR, USA
Tschinkl, Martin, AMTC, Dresden, Germany
Waelpoel, Jacques, ASML, Veldhoven The Netherlands
Wiley, Jim, ASML US Inc., Santa Clara, CA, USA
Wolf, Hermann, Photronics MZD GmbH, Dresden, Germany
Wurm, Stefan, ATICE LLC, Albany, NY, USA
Yoshitake, Shushuke, Yokohama, NuFlare, Japan
Zurbrick, Larry, Keysight Technologies, Santa Clara, CA, USA