The EMLC2017 Program Committee has defined following

Main Conference Keynotes and Invited Speakers:

Tuesday, June 27^th, 2017

• The power of power-semiconductors (Invited)
  Welcome Speaker
  Mathias Kamolz, Infineon Technologies AG, Dresden, Germany
• The status and challenges of the EUV photomask ecosystem (Keynote)
  James N. Wiley, ASML US Inc., Santa Clara, CA, USA
• Best Paper of BACUS 2016 with updates (Invited)
  MBMW-101 multi-beam Mask Writing Performance
  Elmar Platzgummer, IMS Nanofabrication AG, Vienna, Austria
• Breaking the Paradigm: FDX Technology at Globalfoundries (Keynote)
  Bryan Rice, Globalfoundries, Dresden, Germany
•  Best Poster of BACUS 2016 (Invited)
  7 nm e-beam resist sensitivity characterization
  Yusuke Toda, Toppan Photomasks, Inc., Essex Junction, VT, USA,
  Amy Zweber, Globalfoundries, Essex Junction, VT, USA
• Recent EUV developments at IMEC (Invited)
  Kurt Ronse, IMEC, Leuven, Belgium

Wednesday, June 28^th, 2017

• Integral nature of masks through five decades (Keynote)
  Paul Ackmann, Globalfoundries Inc., Santa Clara, USA;
  Tom Faure, Globalfoundries, Vermont, USA
• Report on the panel Discussion of BACUS 2016 (Invited):
  The impact of full-scale curvilinear ILT OPC on photomask manufacturing
  Peter Buck, Mentor Graphics, USA
• Report on the panel discussion of Photomask Japan 2017 (Invited):
  Race for volume production – who is closer to goal: EUVL of NIL?
  Uwe Behringer, UBC Microelectronics, Germany
• Technical trends of large-size photomasks for flat panel displays (Invited)
  Koichiro Yoshida, HOYA Corporation, Tokyo, Japan
• Computational nanometrology of line edge roughness: Recent challenges and advances (Invited)
  V. Constantoudis, Nanometrisis, Greece