Members of the International Program Committee of the EMLC 2014
Conference Chair
Uwe Behringer, UBC Microelectronics, Ammerbuch, Germany
Co-Conference Chairs
Naoya Hayashi, DNP, Saitama, Japan
Brid Connolly, Toppan Photomasks Inc., Dresden, Germany
Chris Gale, Applied Materials, Dresden, Germany
Program Chairs
Jo Finders, ASML, Veldhoven, The Netherlands
Daniel Sarlette, Infineon, Dresden, Germany
Rolf Seltmann, Globalfoundries, Dresden, Germany
Other Members
Michael Arnz, Carl Zeiss SMT AG, Oberkochen, Germany
Emanuele Baracchi, ST Microelectronics, Agrate Brianza, Italy
Carola Blaesing, Carl Zeiss SMS GmbH, Jena, Germany
Parkson Chen, Taiwan Mask Corp., Hsinchu,Taiwan
Natalia Davydova, ASML, Veldhoven, The Netherlands
Rik Jonckheere, IMEC, Leuven, Belgium
Kurt Kimmel, Globalfoundries, Malta, NY, USA
Barbara Lauche, Photronics MZD GmbH, Dresden, Germany
Harry Levinson, Globalfoundries, USA
Hans Löschner, IMS Nanofabrication AG, Vienna, Austria
Jan Hendrik Peters, Carl Zeiss SMS GmbH, Jena, Germany
Chris Progler, Photronics Inc., USA
Emmanuel Rausa, Plasma-Therm USA, St Petersburg, FL, USA
Douglas J. Resnick, Molecular Imprints, Austin, TX, USA
Klaus-Dieter Röth, KLA-Tencor MIE, Weilburg, Germany
Hella Scheer, University of Wuppertal, Germany
Thomas Scherübl, Carl Zeiss SMS GmbH, Jena, Germany
Ronald Schnabel, VDE/VDI-GMM, Frankfurt, Germany
Steffen Schulze, Mentor Graphics Corp. Wilsonville, OR, USA
Mark Staples, Globalfoundries, Dresden, Germany
Ines Stolberg, Vistec Electron Beam GmbH, Jena, Germany
Serge Tedesco, CEA-LETI, Grenoble, France
Jacques Waelpoel, ASML, Veldhoven The Netherlands
Guido Wenz, Wenz Consulting, Weil im Schoenbuch, Germany
Hermann Wolf, Photronics MZD GmbH, Dresden, Germany
Stefan Wurm, SEMATECH, Albany , NY, USA
Larry Zurbrick, Agilent Technologies, Santa Clara, CA, USA