The EMLC2017 Program Committee has defined following
Main Conference Keynotes and Invited Speakers:
Tuesday, June 27th, 2017
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The power of power-semiconductors (Invited)
Welcome Speaker
Mathias Kamolz, Infineon Technologies AG, Dresden, Germany
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The status and challenges of the EUV photomask ecosystem (Keynote)
James N. Wiley, ASML US Inc., Santa Clara, CA, USA
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Best Paper of BACUS 2016 with updates (Invited)
MBMW-101 multi-beam Mask Writing Performance
Elmar Platzgummer, IMS Nanofabrication AG, Vienna, Austria
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Breaking the Paradigm: FDX Technology at Globalfoundries (Keynote)
Bryan Rice, Globalfoundries, Dresden, Germany
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Best Poster of BACUS 2016 (Invited)
7 nm e-beam resist sensitivity characterization
Yusuke Toda, Toppan Photomasks, Inc., Essex Junction, VT, USA,
Amy Zweber, Globalfoundries, Essex Junction, VT, USA
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Recent EUV developments at IMEC (Invited)
Kurt Ronse, IMEC, Leuven, Belgium
Wednesday, June 28th, 2017
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Integral nature of masks through five decades (Keynote)
Paul Ackmann, Globalfoundries Inc., Santa Clara, USA;
Tom Faure, Globalfoundries, Vermont, USA
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Report on the panel Discussion of BACUS 2016 (Invited):
The impact of full-scale curvilinear ILT OPC on photomask manufacturing
Peter Buck, Mentor Graphics, USA
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Report on the panel discussion of Photomask Japan 2017 (Invited):
Race for volume production – who is closer to goal: EUVL of NIL?
Uwe Behringer, UBC Microelectronics, Germany
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Technical trends of large-size photomasks for flat panel displays (Invited)
Koichiro Yoshida, HOYA Corporation, Tokyo, Japan
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Computational nanometrology of line edge roughness: Recent challenges and advances (Invited)
V. Constantoudis, Nanometrisis, Greece