The EMLC 2018 International Program Committee

Conference Chairs 

Behringer, Uwe, UBC Microelectronics, Ammerbuch, Germany
Finders, Jo, ASML, Veldhoven, The Netherlands

Co-Conference Chairs 

Connolly, Brid, Toppan Photomasks Inc., Dresden, Germany
Gale, Chris, Applied Materials, Dresden, Germany
Hayashi, Naoya, DNP, Saitama, Japan

Program Chairs

Stolberg, Ines, Vistec Electron Beam, Jena, Germany
Erdmann, Andreas, Fraunhofer IISB, Erlangen, Germany

Co-Program-Chairs

Seltmann, Rolf, Globalfoundries, Dresden, Germany
Sarlette, Daniel, Infineon, Dresden, Germany 

Other Members

Ehrmann, Albrecht, Carl Zeiss SMT Oberkochen, Germany
Farrar, Dave, HOYA Corporation, London, UK
Galler, Reinhard, EQUicon, Jena, Germany
Jonckheere, Rik, IMEC, Leuven, Belgium
Kapilevich, Izak, Applied Materialsc Inc., Santa Clara, CA, USA
Lauche, Barbara, Photronics MZD GmbH, Dresden, Germany
Le Gratiet, Bertrand, ST Microelectronics, Crolles, France
Levinson, Harry, Globalfoundries, Santa Clara, CA, USA
Loeschner, Hans, IMS Nanofabrication GmbH, Vienna, Austria
Muehlberger, Michael, Profactor GmbH, Steyr-Gleink, Austria
Pain, Laurent, CEA-LETI, Grenoble, France
Peters, Jan Hendrik, bmbg consult, Radebeul, Germany
Progler, Chris, Photronics Inc., San Jose, CA, USA  
Roeth, Klaus-Dieter, KLA-Tencor MIE, Weilburg, Germany
Savari, Serap, Texas A&M University College Station, USA  
Scheruebl, Thomas, Carl Zeiss SMT GmbH, Jena, Germany  
Schnabel, Ronald, VDE/VDI-GMM, Frankfurt, Germany
Schulze, Steffen, Mentor Graphics Corp. Wilsonville, OR, USA
Tschinkl, Martin, AMTC, Dresden, Germany      
Waelpoel, Jacques, ASML, Veldhoven The Netherlands 
Wiley, Jim, ASML US Inc., Santa Clara, CA, USA
Wolf, Hermann, Photronics MZD GmbH, Dresden, Germany  
Wurm, Stefan, ATICE LLC, Albany, NY, USA
Yoshitake, Shushuke, Yokohama, NuFlare, Japan 
Zurbrick, Larry, Keysight Technologies, Santa Clara, CA, USA